Total Photo-Yield Imaging of Stripe Patterns Using Soft X-Ray Microbeam Formed by Wolter-Type Mirror

Abstract
One-dimensional imaging of stripe patterns was performed using the total yield of photoelectrons generated by the irradiation of a 150 eV soft X-ray microbeam formed by a Wolter-type mirror. The samples were aluminum stripes, which were patterned on a SiO2 wafer with the same widths and spacing of either 2 or 4 µ m. When the sagittal beam size of the microbeam was between 1.8 and 3.8 µ m, the patterns were detected with a modulation between 0.06 and 0.11. The imaging indicates that the highest lateral resolution achieved is between 0.7 and 1.3 µ m, when the resolution is defined as the 25%–75% width of the photoelectron count rate change at the pattern edge.

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