MeV, self-ion implantation in Si at liquid nitrogen temperature; a study of damage morphology and its anomalous annealing behavior
- 1 September 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (5) , 2081-2086
- https://doi.org/10.1063/1.346561
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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