Contrast enhanced photoresists—processing and modeling
- 1 December 1983
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 23 (17) , 947-952
- https://doi.org/10.1002/pen.760231706
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Optical requirements for projection lithographySolid-State Electronics, 1981
- Submicron optical lithography using an inorganic resist/polymer bilevel schemeJournal of Vacuum Science and Technology, 1980
- The kinetics of light absorption in photobleaching mediaThe Journal of Physical Chemistry, 1967