Solid single-source metal organic chemical vapor deposition of yttria-stabilized zirconia
- 1 February 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 339 (1-2) , 165-173
- https://doi.org/10.1016/s0040-6090(98)01330-3
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Characterization of a Solid-Source Delivery System for Metal Organic Chemical Vapor Deposition by In-Situ Laser ReflectanceMRS Proceedings, 1997
- Vapor Deposition of Thin-Film Y-Doped ZrO2 For Electrochemical Device ApplicationsMRS Proceedings, 1994
- Pore Narrowing and Formation of Ultrathin Yttria‐Stabilized Zirconia Layers in Ceramic Membranes by Chemical Vapor Deposition/Electrochemical Vapor DepositionJournal of the American Ceramic Society, 1993
- Solid source MOCVD for the epitaxial growth of thin oxide filmsJournal of Crystal Growth, 1993
- Epitaxial zirconia thin films from aqueous precursorsJournal of Materials Research, 1993
- Limiting current type of oxygen sensor with high performanceSensors and Actuators B: Chemical, 1990
- Solid oxide fuel cell technologyIEEE Transactions on Energy Conversion, 1988
- Lattice Parameters and Density for Y2O3‐Stabilized ZrO2Journal of the American Ceramic Society, 1986
- Thermal unimolecular decomposition of nitrous oxide at low pressuresThe Journal of Physical Chemistry, 1985
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977