Temperature-Induced SemiconductingReversible Phase Transition on the-SiC(100) Surface
- 10 November 1997
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 79 (19) , 3700-3703
- https://doi.org/10.1103/physrevlett.79.3700
Abstract
We use combined variable temperature scanning tunneling microscopy and spectroscopy, and angle-resolved photoemission spectroscopy experiments to study transition between two β-SiC(100) surface structures. We observe a reversible temperature-dependent phase transition from a semiconducting surface at 25 °C to a metallic structure at 400 °C. This transition results from temperature-induced disruption of the structure composed of alternately up and down dimers into a structure having all dimers at the same height giving a symmetry. This arrangement favors electronic orbital overlap between Si top surface atoms leading to surface metallization.
Keywords
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