Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography

We report advances in nanoimprint lithography, its application in nanogap metal contacts, and related fabrication yield. We have demonstrated $5\mathrm{nm}$ linewidth and $14\mathrm{nm}$ linepitch in resist using nanoimprint lithography at room temperature with a pressure less than $15\mathrm{psi}$ . We fabricated gold contacts (for the application of single macromolecule devices) with $5\mathrm{nm}$ separation by nanoimprint in resist and lift-off of metal. Finally, the uniformity and manufacturability of nanoimprint over a $4\mathrm{in}\mathrm{.}$ wafer were demonstrated.