Investigation of theDXcenter in heavily dopedn-GaAs
- 17 August 1987
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 59 (7) , 815-818
- https://doi.org/10.1103/physrevlett.59.815
Abstract
Shubnikov–de Haas and persistent-photoconductivity measurements are used to study the mobility, the free-electron density (n), and the occupancy of the DX center in heavily doped n-GaAs [Si,Sn] as a function of doping level and hydrostatic pressure. The results show that the DX center produces a resonant donor level between the Γ and L conduction-band minima at a concentration comparable with the doping level. For the Si-doped samples, comparison with local vibration-mode measurements indicates that the DX level can be identified with .
Keywords
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