Photoelectrochemical etching of silicon
- 1 April 1992
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 37 (5) , 877-888
- https://doi.org/10.1016/0013-4686(92)85039-n
Abstract
No abstract availableKeywords
This publication has 75 references indexed in Scilit:
- Efficiency and Stability Enhancement of n‐Si Photoelectrodes in Aqueous SolutionJournal of the Electrochemical Society, 1991
- Passivation of recombination centers in n-WSe2 yields high efficiency (>14%) photoelectrochemical cellApplied Physics Letters, 1985
- Improved performance of InSe-based photoelectrochemical cells by means of a selective (photo)electrochemical etchingJournal of Applied Physics, 1985
- Photoelectrochemical Cells with Polycrystalline Cadmium Sulfide as PhotoanodesBerichte der Bunsengesellschaft für physikalische Chemie, 1981
- Improved efficiency of CdSe photoanodes by photoelectrochemical etchingApplied Physics Letters, 1980
- Investigation of the chemical properties of stain films on silicon by means of infrared spectroscopySurface Science, 1965
- The preparation of very flat surfaces of silicon by electropolishingSolid-State Electronics, 1963
- An Electropolishing Technique for Germanium and SiliconJournal of the Electrochemical Society, 1963
- Electropolishing Silicon in Hydrofluoric Acid SolutionsJournal of the Electrochemical Society, 1958
- Electrolytic Shaping of Germanium and SiliconBell System Technical Journal, 1956