(100) and (110) SiSiO2 interface studies by MeV ion backscattering
- 1 October 1980
- journal article
- Published by Elsevier in Surface Science
- Vol. 100 (1) , 35-42
- https://doi.org/10.1016/0039-6028(80)90442-2
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Studies of the Si-SiO2 interface by MeV ion channelingApplied Physics Letters, 1979
- Use of Thin Si Crystals in Backscattering-Channeling Studies of the Si-SiInterfacePhysical Review Letters, 1978
- Calculation of the backscattering-channeling surface peakSurface Science, 1978
- Significance of the channeling surface peak in thin-film analysisApplied Physics Letters, 1978
- Analysis of surface layers by the channeling technique: Beam energy dependenceApplied Physics Letters, 1975
- Stopping cross sections and backscattering factors for 4He ions in matter Z = 1–92, E(4He) = 400–4000 keVAtomic Data and Nuclear Data Tables, 1974
- Stoichiometry of thin silicon oxide layers on siliconApplied Physics Letters, 1974
- Line-shape extraction analysis of silicon oxide layers on silicon by channelling effect measurementsThin Solid Films, 1973
- Silicon surface studies by means of proton backscattering and proton induced X-Ray emissionRadiation Effects, 1973