Photo-oxidation of amorphous silicon-carbon alloys and its use in field effect transistors
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 115 (1) , 84-86
- https://doi.org/10.1016/0022-3093(89)90368-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- High spatial resolution photo-oxidation of a-Si:C at low temperatures H filmsElectronics Letters, 1989
- Amorphous silicon-silicon nitride thin-film transistorsApplied Physics Letters, 1981