Characterization of α-Fe2O3 thin films deposited by atmospheric pressure CVD onto alumina substrates
- 31 August 1996
- journal article
- Published by Elsevier in Sensors and Actuators B: Chemical
- Vol. 34 (1-3) , 412-416
- https://doi.org/10.1016/s0925-4005(97)80014-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Preparation and gas-sensing properties of α-Fe2O3 thin filmsJournal of Electronic Materials, 1995
- Gas-sensing properties of α-Fe2O3 thin films prepared by plasma-enhanced chemical vapour depositionThin Solid Films, 1994
- Characterization of SnO2 films deposited by d.c. gas discharge activating reaction evaporation onto amorphous and crystalline substratesThin Solid Films, 1993
- Characteristics of α-Fe2O3 thick film gas sensorsThin Solid Films, 1991
- Enhancement of Gas Sensitivity by Controlling Microstructure of α–Fe2O3 CeramicsJapanese Journal of Applied Physics, 1983