SWELLING OF NEGATIVE RESIST SYSTEMS USED IN E-BEAM LITHOGRAPHY†

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Abstract
Radiation-crosslinking polymeric resist systems are compared on the basis of number of components, molecular structure, average molecular weight and molecular weight distribution. These factors can be correlated with sensitivity, contrast, resolution, and ease of removal (stripping). Systems include single component polymers (including derivatized chains) as well as two-component systems where a reactive plasticizer participates. For the crosslinking, negative-working resists, swelling is the paramount factor governing resolution. Swelling can be diminished by: 1. Choosing a polymer-solvent combination with low interaction, that is, a high interaction parameter, χ, 2. Using a low-molecular-weight polymer, and, 3. Adding a network-forming monomer that is polyfunctional and compatible in monomeric and polymeric states with the host polymer

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