Getter sputtering—a review
- 1 March 1974
- Vol. 24 (3) , 107-116
- https://doi.org/10.1016/0042-207x(74)92453-1
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—I. Target processesVacuum, 1972
- Characteristics of rf Sputtered Barium Titanate Films on SiliconJournal of Vacuum Science and Technology, 1972
- Aluminum films deposited by rf sputteringMetallurgical Transactions, 1970
- Bias sputtering: its techniques and applicationsVacuum, 1967
- Sputtering Studies of Insulators by Means of Langmuir ProbesJournal of Applied Physics, 1965
- Getter Sputtering for the Preparation of Thin Films of Superconducting Elements and CompoundsJournal of Applied Physics, 1964
- Superconductive Films Made by Protected Sputtering of Tantalum or NiobiumJournal of Applied Physics, 1962
- Design of an apparatus for cathode sputteringJournal of Scientific Instruments, 1933
- CATHODE SPUTTERINGReview of Scientific Instruments, 1930
- The preparation of mirrors by sputtering metals on to glass surfacesJournal of Scientific Instruments, 1930