Improved device performance using a semi-transparent p-contact AlGaN/GaN heterojunction positive-intrinsic-negative photodiode
- 4 October 1999
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 75 (14) , 2138-2140
- https://doi.org/10.1063/1.124942
Abstract
We report on the improved device performance of GaN-based ultraviolet heterojunction photodiodes using a semi-transparent p-contact device structure. At a reverse bias of 10 V, these photodiodes exhibit a low dark current density of 0.3 nA/cm2. The external quantum efficiency is 38% at the band edge, with only a slight decrease at the shorter wavelengths. The forward current is >10 mA at Fitting of the forward current–voltage data to the diode equation yields a very low series resistance which results in a very fast decay of the time response. The improved performance afforded by the thin, semi-transparent, p-contact layer is due to an increase in the uniformity of the lateral field distribution.
Keywords
This publication has 5 references indexed in Scilit:
- High-transparency Ni/Au ohmic contact to p-type GaNApplied Physics Letters, 1999
- Low-resistance ohmic contacts to p-type GaNApplied Physics Letters, 1999
- Very high-speed ultraviolet photodetectors fabricated on GaNJournal of Electronic Materials, 1999
- Low noise p-π-n GaN ultraviolet photodetectorsApplied Physics Letters, 1997
- High speed, low noise ultraviolet photodetectors based on GaN p-i-n and AlGaN(p)-GaN(i)-GaN(n)structuresApplied Physics Letters, 1997