Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
- 15 July 1995
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 78 (2) , 1370-1372
- https://doi.org/10.1063/1.360313
Abstract
Fluorinated amorphous carbonfilms were proposed as low dielectric constant interlayer dielectrics for ultralarge scale integration circuits. The films were deposited by plasma enhanced chemical vapor deposition with CH4 and CF4 in a parallel plate rf (13.56 MHz) reactor. The dielectric constant of the amorphous carbonfilmsdeposited with CH4 was increased with increases in rf power. The addition of CF4 to CH4 raised the deposition rate and reduced the dielectric constant. At an rf power of 200 W, and at a flow rate of 47 sccm for CF4 and 3 sccm for CH4, the dielectric constant of the fluorinated amorphous carbonfilms was 2.1.This publication has 9 references indexed in Scilit:
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