Capacitance Measurements on Alloyed Indium-Germanium Junction Diodes
- 1 December 1955
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 26 (12) , 1514-1517
- https://doi.org/10.1063/1.1721941
Abstract
Donor densities in the base material of fused junction diodes, inferred from capacitance data, are used to calculate majority carrier mobilities. The dependence of capacitance on reverse bias at very low biases is found to be given by the sum of two terms, a space charge capacitance and a capacitance due to the flow of holes as given by Shockley's low level p‐n junction theory.This publication has 8 references indexed in Scilit:
- Zur Theorie der Gleichrichtung am Kontakt Metall-HalbleiterThe European Physical Journal A, 1954
- Die Sperrschichtkapazität des legierten Germanium-Indium-GleichrichtersThe European Physical Journal A, 1954
- Resistivity Measurements on Germanium for TransistorsProceedings of the IRE, 1954
- Part V-The Properties of Metal to Semiconductor ContactsProceedings of the IRE, 1953
- Drift Mobilities in Semiconductors. I. GermaniumPhysical Review B, 1953
- Silicon P-N Junction Alloy DiodesProceedings of the IRE, 1952
- Theory and Experiment for a GermaniumJunctionPhysical Review B, 1951
- The Theory ofp-nJunctions in Semiconductors andp-nJunction TransistorsBell System Technical Journal, 1949