Deep center photoluminescence study of low-temperature InP grown by molecular beam epitaxy
- 16 November 1992
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (20) , 2443-2445
- https://doi.org/10.1063/1.108167
Abstract
Low-temperature grown (130–480 °C) InP was investigated using photoluminescence spectroscopy with changes of excitation intensity and temperature. Two deep broad photoluminescence bands at ∼0.8 and 1.06 eV are present in undoped and Be-doped materials, and their formation strongly depends on the growth temperature. PIn and VIn related centers are associated with the transitions at 0.8 and 1.06 eV bands via the deep donor PIn–Be acceptor pair and the conduction band-to-VIn acceptor transitions, respectively. A configuration coordinate model is used to locate the deep donor and acceptor levels.Keywords
This publication has 14 references indexed in Scilit:
- Electrical properties of InP grown by gas-source molecular beam epitaxy at low temperatureApplied Physics Letters, 1992
- Electrical and optical characterization of gas source and solid source MBE low temperature buffersJournal of Crystal Growth, 1991
- Properties and applications of AlxGa1−xAs (0 ≤ χ ≤1) grown at low temperaturesJournal of Crystal Growth, 1991
- Low-Temperature Growth and Characterization of InP Grown by Gas-Source Molecular-Beam EpitaxyMRS Proceedings, 1991
- Electronic structure of the isolated vacancies and divacancy in InPPhysical Review B, 1990
- Arsenic precipitates and the semi-insulating properties of GaAs buffer layers grown by low-temperature molecular beam epitaxyApplied Physics Letters, 1990
- Electromigration behavior of aluminum films deposited on silicon by ionized cluster beam and other techniquesApplied Physics Letters, 1989
- On the origin of cathodoluminescence contrast phenomena in semiinsulating GaAsPhysica Status Solidi (a), 1988
- Triplet Spin ODMR from Phosphorous Antisites in Undoped InPMaterials Science Forum, 1986
- Photoluminescence identification of the C and Be acceptor levels in InPJournal of Electronic Materials, 1984