Oxidation behaviour of LPCVD silicon oxynitride films
- 1 September 1988
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 33-34, 757-764
- https://doi.org/10.1016/0169-4332(88)90377-7
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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