The Deposition of Atoms Sputtered in an Abnormal Glow Discharge
- 1 June 1967
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 38 (7) , 2960-2962
- https://doi.org/10.1063/1.1710032
Abstract
Using an optical‐transmission method, the deposition of sputtered Ni atoms on a glass collector in an abnormal glow discharge is measured in Ar and Ar‐H2 mixture at 5 Torr. The distribution of atoms deposited on a glass collector is found to be determined by the diffusion process of sputtered atoms in the gases. The results show that the sputtering rate is proportional to the square of the current, and the sputtering rate of 100% Ar is about twice as large as that of 70% Ar‐30% H2 mixture.This publication has 2 references indexed in Scilit:
- Cathode sputtering in inert-gas glow dischargesBritish Journal of Applied Physics, 1961
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961