Shear-limited flux pinning studied in superconducting thin-film devices
- 22 February 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 52 (8) , 662-664
- https://doi.org/10.1063/1.99367
Abstract
We report critical-current measurements on superconducting devices containing nanometer-scale artificially structured channels of low pinning which simulate microstructures in technical superconductors. Our observations uniquely demonstrate the role of the grain morphology for flux pinning in polycrystalline materials. The results are in very good agreement with a continuum model for the shear-limited pinning force.Keywords
This publication has 9 references indexed in Scilit:
- Nanometer-scale structure for the study of flux-line lattice shearing in superconducting double layers of a-Nb3Ge and NbNJournal of Vacuum Science & Technology B, 1988
- The role of grain boundaries in determining J c in high-field high-current superconductorsPhilosophical Magazine Part B, 1987
- Flux Line Shear Studied in Sputtered NbN FilmsJapanese Journal of Applied Physics, 1987
- Dimensional crossover in collective flux pinningPhysical Review B, 1986
- Peak and history effects in two-dimensional collective flux pinningPhysical Review B, 1986
- Two-dimensional collective flux pinning, defects, and structural relaxation in amorphous superconducting filmsPhysical Review B, 1983
- Collective-Flux-Pinning Phenomena in Amorphous SuperconductorsPhysical Review Letters, 1981
- On the shear modulus of the flux line latticePhysica Status Solidi (b), 1976
- Scaling laws for flux pinning in hard superconductorsJournal of Applied Physics, 1973