Study of the growth characteristics of sputtered Cr thin films

Publisher Website
Google Scholar
Abstract
The crystallographic texture of Cr film deposited on glass substrates is found to depend on the film thickness dCr and the substrate temperature Ts. Without substrate preheating, only the Cr {110} peak was observed in the x-ray diffraction spectra for films between 60 and 400 nm in thickness. With increasing Ts (by substrate preheating), the Cr{200} peak became observable at progressively increasing intensity, whereas the intensity of the {110} peak decreased. Consequently the 170-nm-thick films deposited at Ts ≥200 °C are predominantly {100} textured. However, even for these high Ts values (≥200 °C), the {110} peak intensity increases with increasing film thickness. Larger film thickness values are required at higher Ts for the {110} texture to overcome the {100} texture. The grain size of the Cr films deposited on glass increases with film thickness and with substrate temperature.