A thermally activated solid state reaction process for fabricating ohmic contacts to semiconducting diamond
- 1 September 1990
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (5) , 2246-2254
- https://doi.org/10.1063/1.346529
Abstract
Techniques have been developed to produce ohmic contacts to naturally occurring boron doped semiconducting diamond. Thin films of Mo, Mo/Au, and Mo/Ni/Au deposited on diamond produced adherent ohmic contacts after annealing at 950 °C. A thermally activated solid state reaction which produces a refractory carbide precipitate at the original diamond/metal interface is the principal factor in affecting the properties of the contacts. The interface reaction has been characterized using Auger electron spectroscopy, scanning electron microscopy, x‐ray diffraction, metallography, and I‐V measurements.This publication has 31 references indexed in Scilit:
- Preparation of ohmic contacts to semiconducting diamondJournal of Physics D: Applied Physics, 1989
- Electrical Characteristics of Metal Contacts to Boron-Doped Diamond Epitaxial FilmJapanese Journal of Applied Physics, 1989
- A Comparison of the C KVV Auger Spectra of NbC and NbN0.7C0.3Physica Status Solidi (b), 1985
- The Discrete Variational Xα‐Method Interpretation of the C KVV and Ti L2,3M2,3V Auger Spectra of TiCPhysica Status Solidi (b), 1984
- Dosimetry with a diamond operating as a resistorPhysics in Medicine & Biology, 1981
- The C-V characteristics of Schottky barriers on laboratory grown semiconducting diamondsSolid-State Electronics, 1973
- Photothermal Ionization and Photon-Induced Tunneling in the Acceptor Photoconductivity Spectrum of Semiconducting DiamondPhysical Review B, 1968
- Metal-semiconductor surface barriersSolid-State Electronics, 1966
- Evidence for Hopping Transport in Boron-Doped DiamondPhysical Review B, 1962
- Rectification, Photoconductivity, and Photovoltaic Effect in Semiconducting DiamondPhysical Review B, 1958