Simulations of high-rate diamond synthesis: Methyl as growth species
- 15 July 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (3) , 277-279
- https://doi.org/10.1063/1.105620
Abstract
The results of numerical simulations of two high-rate diamond growth environments (oxygen-acetylene torch and dc arcjet) are reported. The calculations account in detail for boundary-layer transport, gas-phase chemistry, and gas-surface chemistry. Diamond growth rates are calculated self-consistently with the gas-phase concentrations, using a recently proposed methyl growth mechanism. The calculated growth rates agree well with the measured values, indicating that this growth mechanism can account for both high- and low-rate diamond growth.Keywords
This publication has 12 references indexed in Scilit:
- Plasma properties of a hydrocarbon arcjet used in the plasma deposition of diamond thin filmsJournal of Applied Physics, 1990
- Numerical modeling of the filament-assisted diamond growth environmentJournal of Applied Physics, 1990
- Methyl versus acetylene as diamond growth speciesJournal of Materials Research, 1990
- Mechanism of diamond film growth by hot-filament CVD: Carbon-13 studiesJournal of Materials Research, 1990
- The Growth Mechanism of Diamond Crystals in Acetylene FlamesJapanese Journal of Applied Physics, 1990
- Mechanism for diamond growth from methyl radicalsApplied Physics Letters, 1990
- A flow-tube study of diamond film growth: methane versus acetyleneJournal of Materials Science Letters, 1990
- An investigation of diamond film deposition in a premixed oxyacetylene flameJournal of Applied Physics, 1990
- Flame Structure and Diamond Growth Mechanism of Acetylene TorchJapanese Journal of Applied Physics, 1989
- Diamond synthesis using an oxygen-acetylene torchMaterials Letters, 1988