Properties of carbon films produced by R.F. Plasma chemical vapour deposition
- 10 December 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 43-44, 813-820
- https://doi.org/10.1016/0257-8972(90)90023-6
Abstract
No abstract availableFunding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 5 references indexed in Scilit:
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- Properties of carbon coating films produced by electron cyclotron resonance plasmasJournal of Vacuum Science & Technology A, 1987
- Carbonization in tokamaksJournal of Nuclear Materials, 1987
- Preparation of hard coatings by ion beam methodsThin Solid Films, 1979
- Raman Spectrum of GraphiteThe Journal of Chemical Physics, 1970