A comparison of TiN films produced by reactive d.c. sputtering and ion-assisted deposition
- 15 May 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 200 (2) , 283-291
- https://doi.org/10.1016/0040-6090(91)90200-h
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Ion beam modification of TiN films during vapor depositionMaterials Science and Engineering, 1987
- Cr+ Ion irradiation and thermal annealing of chromium films on silicon for formation of silicidesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Material selection for hard coatingsJournal of Vacuum Science & Technology A, 1986
- The microstructure of sputter‐deposited coatingsJournal of Vacuum Science & Technology A, 1986
- Surface modification by ion beamsVacuum, 1986
- Parameter optimization for film homogenization during ion assisted depositionVacuum, 1986
- Higher nitrides of hafnium, zirconium, and titanium synthesized by dual ion beam depositionJournal of Materials Research, 1986
- A computer program for the analysis of RBS spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- Structure and properties of TiN coatingsThin Solid Films, 1985
- A two-gun ion beam system for dynamic recoil implantationVacuum, 1978