Ion beam modification of TiN films during vapor deposition
- 30 June 1987
- journal article
- Published by Elsevier in Materials Science and Engineering
- Vol. 90, 357-365
- https://doi.org/10.1016/0025-5416(87)90233-3
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- In situ auger electron spectroscopy applied to the study of chemisorption and diffusion during reactive implantation of titanium into ironApplied Surface Science, 1986
- Diffusion of nickel through titanium nitride filmsJournal of Vacuum Science & Technology A, 1985
- Adherent TiN films produced by ion beam enhanced deposition at room temperatureNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Influence of ion implantation and overlay coatings on various physico-mechanical and wear properties of stainless steel, titanium and aluminiumThin Solid Films, 1979
- Structure and properties of deposits grown by ion-beam-activated vacuum deposition techniquesThin Solid Films, 1979
- Film preparation using plasma or ion activationThin Solid Films, 1979