Preparation and properties of amorphous TiO2 thin films by plasma enhanced chemical vapor deposition
- 1 January 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 237 (1-2) , 105-111
- https://doi.org/10.1016/0040-6090(94)90245-3
Abstract
No abstract availableKeywords
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