70 nm Features on 140 nm period using evanescent near field optical lithography
- 30 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4) , 237-240
- https://doi.org/10.1016/s0167-9317(00)00305-1
Abstract
No abstract availableKeywords
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