Progress in the development of extreme ultraviolet lithography exposure systems
- 1 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4) , 19-22
- https://doi.org/10.1016/s0167-9317(99)00007-6
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Extreme ultraviolet lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- EUV optical design for a 100-nm CD imaging systemPublished by SPIE-Intl Soc Optical Eng ,1998
- High-power extreme-ultraviolet source based on gas jetsPublished by SPIE-Intl Soc Optical Eng ,1998
- Soft x-ray reduction lithography using multilayer mirrorsJournal of Vacuum Science & Technology B, 1989