Photochemical deposition and characterization of Al2O3 and TiO2
- 1 December 1988
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 3 (6) , 1151-1157
- https://doi.org/10.1557/jmr.1988.1151
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Mechanisms for the Deposition of Thin Metallic Films by Laser Driven Gas Phase ReactionsMRS Proceedings, 1986
- Photodeposition of metal films with ultraviolet laser lightJournal of Vacuum Science and Technology, 1982
- InP metal/oxide/semiconductor devices incorporating Al2O3 dielectrics chemically vapour deposited at low pressureThin Solid Films, 1982