Interferometric investigation of the SiSiO2 interregion at wavelengths of 110–130 Å
- 15 April 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 208 (1-3) , 605-608
- https://doi.org/10.1016/0167-5087(83)91191-2
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Spectroscopic Analysis of the Interface Between Si and Its Thermally Grown OxideJournal of the Electrochemical Society, 1980
- A simple system of the short-wave synchrotron radiation prevention in the 30 Å to 180 Å wavelength rangeNuclear Instruments and Methods, 1978
- Reflectivity Measurements near the L2,3Edge ofpandn-type SiliconJapanese Journal of Applied Physics, 1975
- Extreme Ultraviolet Transmission of Crystalline and Amorphous SiliconPhysical Review Letters, 1972
- Optical properties of non-crystalline Si, SiO, SiOx and SiO2Journal of Physics and Chemistry of Solids, 1971