Processes for Large Scale Photonic Integrated Circuits

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Abstract
The Silicon integrated circuit (IC) industry had evolved during the last 35 years by introducing and refining several important Silicon based processes (such as I2L, NMOS, CMOS etc). A process is comprised of a set of processing steps (e.g. Photolithography (Plit), etching, implantation etc.) which are executed in a precise order and under rigidly controlled conditions. The individual devices differ only by the set of Plit masks that are being used on a particular wafer. Our goal here is to develop a process, in the same sense, for large scale photonic integrated circuits (PIC's). Some of the building elements are; a. lasers. b. optical amplifiers. c. grating filters. d. passive waveguides. e. waveguide branches and passive couplers. f. directional couplers g. optical switches. h. optical modulators. i. waveguide detectors.

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