Calculation of critical layer thickness considering thermal strain in Si1−xGex/Si strained-layer heterostructures
- 1 January 1998
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 83 (1) , 171-173
- https://doi.org/10.1063/1.366730
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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