Optical absorption of a-SiNx:H films prepared by RF glow-discharge
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 605-608
- https://doi.org/10.1016/0022-3093(83)90656-7
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Anomalous Optical and Structural Properties of B-Doped a-Si:HJapanese Journal of Applied Physics, 1982
- Optical properties of a-Si:H and a-SixC1−x:H films prepared by glow-discharge depositionSolar Energy Materials, 1982
- Properties of Amorphous Films Prepared from SiH4–N2–H2 Gas MixtureJapanese Journal of Applied Physics, 1982
- Wide Optical-Gap, Photoconductive a-SixN1-x:HJapanese Journal of Applied Physics, 1981
- Boron Doping of Hydrogenated Silicon Thin FilmsJapanese Journal of Applied Physics, 1981
- Influence of hydrogen on optical properties of a-Si : HJournal of Applied Physics, 1980
- Optical properties and hydrogen concentration in amorphous siliconThin Solid Films, 1979