Characterization of ultrathin zirconium oxide films on silicon using photoelectron spectroscopy
- 16 October 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 59 (1-4) , 373-378
- https://doi.org/10.1016/s0167-9317(01)00671-2
Abstract
No abstract availableKeywords
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