Exposure latitude and CD control study for additively patterned X-ray mask with GBit DRAM complexity
- 31 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4) , 195-198
- https://doi.org/10.1016/0167-9317(95)00225-1
Abstract
No abstract availableKeywords
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