Electron cyclotron resonance deposition and plasma diagnostics of a-Si:H and a-C:H films
- 31 December 1989
- journal article
- Published by Elsevier in Solar Cells
- Vol. 27 (1-4) , 331-340
- https://doi.org/10.1016/0379-6787(89)90041-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Raman scattering characterization of carbon bonding in diamond and diamondlike thin filmsJournal of Vacuum Science & Technology A, 1988
- Magnetic field gradient effects on ion energy for electron cyclotron resonance microwave plasma streamJournal of Vacuum Science & Technology A, 1988
- Low-temperature film growth of Si by reactive ion beam depositionApplied Physics Letters, 1987