New approach of a laser-induced forward transfer for deposition of patterned thin metal films
- 1 February 1995
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 86 (1-4) , 202-207
- https://doi.org/10.1016/0169-4332(94)00385-8
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Laser induced forward transfer: The effect of support-film interface and film-to-substrate distance on transferApplied Physics A, 1992
- Minimum fluence for laser blow-off of thin gold films at 248 and 532 nmApplied Physics Letters, 1990
- Laser-induced forward transfer: A new approach for the deposition of high Tc superconducting thin filmsJournal of Materials Research, 1989
- Pulsed laser ablative deposition of thin metal filmsApplied Surface Science, 1989
- Laser-driven micro-explosive bonding of aluminium films to copper and siliconJournal of Materials Science, 1988
- Metal deposition at 532 nm using a laser transfer techniqueJournal of Applied Physics, 1988
- A study of the mechanism of metal deposition by the laser-induced forward transfer processJournal of Vacuum Science & Technology B, 1987
- The thermal decomposition of palladium acetateJournal of Thermal Analysis and Calorimetry, 1986
- Metal deposition from a supported metal film using an excimer laserJournal of Applied Physics, 1986
- Chemical Processing with LasersPublished by Springer Nature ,1986