Incorporation of nitrogen into diamond-like carbon films
- 28 February 1994
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 3 (3) , 210-221
- https://doi.org/10.1016/0925-9635(94)90082-5
Abstract
No abstract availableKeywords
This publication has 42 references indexed in Scilit:
- Electrical characteristics of plasma-deposited diamondlike carbon/silicon metal–insulator–semiconductor structuresJournal of Vacuum Science & Technology A, 1992
- Erosion of diamond films and graphite in oxygen plasmaJournal of Materials Research, 1991
- Carbon–Nitrogen Pyrolyzates: Attempted Preparation of Carbon NitrideJournal of the American Ceramic Society, 1991
- Structure and bonding studies of the C:N thin films produced by rf sputtering methodJournal of Materials Research, 1990
- Role of microstructure on the oxidation behavior of microwave plasma synthesized diamond and diamond-like carbon filmsJournal of Materials Research, 1990
- Pyrolytic Deposition of Carbon Films Containing Nitrogen and/or BoronJournal of the American Ceramic Society, 1990
- Reactive ion etching of diamondApplied Physics Letters, 1989
- EELS analysis of vacuum arc-deposited diamond-like filmsPhilosophical Magazine Letters, 1988
- Characterization of diamondlike carbon films and their application as overcoats on thin-film media for magnetic recordingJournal of Vacuum Science & Technology A, 1987
- Electronic and atomic structure of amorphous carbonPhysical Review B, 1987