Pyrolytic Deposition of Carbon Films Containing Nitrogen and/or Boron

Abstract
Carbon films containing nitrogen and/or boron were prepared in a closed system by the pyrolysis of appropriate precursor materials. The decomposition products of the pyrolysis were identified and the resulting films were characterized by chemical and physical means. The electrical conductivity of the heteroatom‐containing films is similar to that of pure amorphous carbon films. Boron nitride was present in the C‐N‐B film as revealed by XPS and IR spectroscopy. Oxygen appeared to have a role in the adherence of the films to the silica substrate.