Formation of Cubic GaN on (111)B GaAs by Metal-Organic Vapor-Phase Epitaxy with Dimethylhydrazine

Abstract
The microstructure of GaN grown on (111)B GaAs by a metal-orgnic vapor-phase epitaxy method has been examined by transmission electron microscopy. Trimethylgallium and dimethylhydrazine were used as the source materials. It was revealed that the GaN crystal has a zincblende structure and is formed heterogeneously penetrating into the GaAs substrate. In a GaN crystal, stacking faults propagate on {111} planes other than those normal to the growth direction.