Characterisation of aluminium oxynitride gas barrier films
- 1 June 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 388 (1-2) , 78-86
- https://doi.org/10.1016/s0040-6090(01)00836-7
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- Design considerations for the AC/DC C-MAG® deposition source and power supply systemThin Solid Films, 1999
- SiOx Gas Barrier Coatings on Polymer Substrates: Morphology and Gas Transport ConsiderationsThe Journal of Physical Chemistry B, 1999
- Activated Rate Theory Treatment of Oxygen and Water Transport through Silicon Oxide/Poly(ethylene terephthalate) Composite Barrier StructuresThe Journal of Physical Chemistry B, 1997
- Atomic Force Microscopy Study of Hard Coating Films Prepared by Pulsed Laser Deposition MethodMRS Proceedings, 1996
- A Method to Measure the Adhesion of Thin Glass Coatings on Polymer FilmsThe Journal of Adhesion, 1994
- The permeation of gases through a poly (ethylene terephthalate) membrane deposited with SiO2Journal of Membrane Science, 1991
- An aluminum oxynitride filmThin Solid Films, 1991
- Ion assisted deposition of oxynitrides of aluminum and siliconJournal of Vacuum Science & Technology A, 1989
- Optical and electrical characterizations of laser–chemical-vapor-deposited aluminum oxynitride filmsJournal of Applied Physics, 1986
- Helium Diffusion Through GlassJournal of the American Ceramic Society, 1953