Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms
- 10 February 1995
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 34 (5) , 897-903
- https://doi.org/10.1364/ao.34.000897
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 4 references indexed in Scilit:
- Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithographyApplied Optics, 1994
- Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithographyApplied Optics, 1994
- Phase holograms in polymethyl methacrylateJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Methods for proximity effect correction in electron lithographyJournal of Vacuum Science & Technology B, 1990