Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography
- 1 March 1994
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 33 (7) , 1176-1179
- https://doi.org/10.1364/ao.33.001176
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 4 references indexed in Scilit:
- Multilevel grating array illuminators manufactured by electron-beam lithographyOptics Communications, 1992
- Nd:YAG laser machining with multilevel resist kinoformsApplied Optics, 1991
- Multilevel phase holograms manufactured by electron-beam lithographyOptics Letters, 1990
- Proximity effect in electron-beam lithographyJournal of Vacuum Science and Technology, 1975