Atomic depth distribution analysis of Ag and Au on Si(111) during epitaxial growth by total reflection angle X-ray spectroscopy
- 1 September 1993
- journal article
- Published by Elsevier in Surface Science
- Vol. 294 (1-2) , 53-66
- https://doi.org/10.1016/0039-6028(93)90158-g
Abstract
No abstract availableKeywords
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