Properties of hydrogenated amorphous silicon prepared by alternatively repeating chemical-vapor deposition from disilane and hydrogen plasma treatment
- 15 August 1993
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 74 (4) , 2543-2549
- https://doi.org/10.1063/1.354695
Abstract
No abstract availableThis publication has 23 references indexed in Scilit:
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