Characterization of low pressure deposited diamond films by X-ray photoelectron spectroscopy
- 1 December 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 1079-1086
- https://doi.org/10.1016/0040-6090(90)90265-f
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Deposition of diamond films at low pressures and their characterization by positron annihilation, Raman, scanning electron microscopy, and x-ray photoelectron spectroscopyApplied Physics Letters, 1990
- Characterization of diamond films by Raman spectroscopyJournal of Materials Research, 1989
- Diamond-like carbon films prepared with a laser ion sourceApplied Physics Letters, 1988
- The C K L L first-derivative x-ray photoelectron spectroscopy spectra as a fingerprint of the carbon state and the characterization of diamondlike carbon filmsJournal of Vacuum Science & Technology A, 1987
- About the structure and bonding of laser generated carbon films by raman and electron energy loss spectroscopyJournal of Non-Crystalline Solids, 1986
- Preparation of sp3-Rich Amorphous Carbon Film by Hydrogen Gas Reactive RF-Sputtering of Graphite, and Its PropertiesJapanese Journal of Applied Physics, 1984
- rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applicationsJournal of Applied Physics, 1983
- X-ray photoemission studies of diamond, graphite, and glassy carbon valence bandsPhysical Review B, 1974
- X-Ray Photoemission Cross-Section Modulation in Diamond, Silicon, Germanium, Methane, Silane, and GermanePhysical Review B, 1973
- Plasma Losses by Fast Electrons in Thin FilmsPhysical Review B, 1957