-Si(111) as a model ionic-covalent system: Transition from chemisorption to epitaxy
- 15 August 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 48 (8) , 5716-5719
- https://doi.org/10.1103/physrevb.48.5716
Abstract
The demands of chemisorption and epitaxy are quite different for electronically dissimilar systems. The transition between these two regimes in -Si(111) is studied with transmission-electron microscopy and photoemission. Changes in the electronic structure of the evolving growth surface are expressed in the composite growth mode, a Stranski-Krastanow pathway to layer-by-layer growth, which begins with coherent island formation on a Si-CaF layer. After this transition, layer-by-layer homoepitaxy is possible even at room temperature, and the critical thickness can be extended.
Keywords
This publication has 18 references indexed in Scilit:
- New insight into the structure and growth of CaF2/Si(111)Applied Physics Letters, 1992
- Effect of strain on surface morphology in highly strained InGaAs filmsPhysical Review Letters, 1991
- Dislocation-free Stranski-Krastanow growth of Ge on Si(100)Physical Review Letters, 1990
- /Si heteroepitaxy: Importance of stoichiometry, interface bonding, and lattice mismatchPhysical Review B, 1990
- Scanning tunneling microscopy of insulators: CaF2 epitaxy on Si (111)Applied Physics Letters, 1989
- Structure of the Si(111)-CaInterfacePhysical Review Letters, 1988
- Evidence for the influence of interfacial atomic structure on electrical properties at the epitaxial/Si(111) interfacePhysical Review Letters, 1988
- Resolution function of an X-ray triple-crystal diffractometerActa Crystallographica Section A Foundations of Crystallography, 1987
- Photoemission study of bonding at the-on-Si(111) interfacePhysical Review B, 1987
- Electronic structure of the/Si(111) interfacePhysical Review B, 1986