Temperature Uniformity Optimization Using Three-Zone Lamp and Dynamic Control in Rapid Thermal Multiprocessor
- 1 January 1991
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Single Wafer Rapid Thermal MultiprocessingMRS Proceedings, 1989
- Thermal and stress analysis of semiconductor wafers in a rapid thermal processing ovenIEEE Transactions on Semiconductor Manufacturing, 1988
- Defects introduced in silicon wafers during rapid isothermal annealing: Thermoelastic and thermoplastic effectsJournal of Applied Physics, 1984