Heating and melting of a film on a substrate
- 1 September 1973
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 44 (9) , 4204-4208
- https://doi.org/10.1063/1.1662919
Abstract
Approximate results are given for the time required to melt a film on a thick substrate if the time dependence of the film temperature is known up to the melting point. Results for temperature versus time are given for a uniformly heated film and for a film heated by very strongly absorbed light incident either from the free surface or through the substrate. The calculations assume one‐dimensional heat flow, but a simple model with radial heat flow is treated in the Appendix.This publication has 6 references indexed in Scilit:
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